SE: Especially with advanced nodes, there are many types of variation in the process and today’s design and verification tools have to understand this. How does variation impact the sphere of your ...
Upcoming 14A and 10A process nodes will use high-NA EUV anamorphic scanners, which will require two stitched half-fields to achieve the equivalent wafer exposure area of previous-generation scanners, ...
Special cause variation, I love to see it! That’s because I know I’m about to learn something important about my process. A ...
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