Pandemic or not, Tracee Ellis Ross’ popular hair care line Pattern Beauty is moving forward with new products by adding something different to their lineup: styling products! For Phase 2, which ...
Extreme ultraviolet (EUV) lithography exposed resist patterns can exhibit excessive line edge roughness (LER) and line width roughness (LWR) due to random or shot noise. Increasing the EUV exposure ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results
Feedback